Category: Low Pressure Plasma Sources

Coaxial plasma sources uses solid state microwave technology.

AURA-WAVE is an Electron Cyclotron Resonance (ECR) coaxial plasma source. It has been designed to be self-adapted once the plasma ignited. A magnetic field combined to the electromagnetic wave allows the creation of plasma at low pressure due to Electron Cyclotron Resonance.

HI-WAVE collisional coaxial plasma source was designed to avoid inside power-losses and has proved to be matched, i.e. no reflected power with no additional impedance matching system over 1 pressure decade, depending on the plasma gas. Moreover, plasma density higher than 1012 cm-3 could be easily obtained in multisource configuration at a few cm

from the sources. Typical applications of such source are generation of radicals (e.g. atomic oxygen), etching, PECVD and surface treatment

	AURA Wave – ECR type	Hi-Wave – Collisional type
Pressure range	10-4 to 10-2 mbar	10-2 – 10-1 mbar
Gas type	Ar, N2, O2, CH4, He, air,..	Ar, O2, N2, air, H2, CH4
Plasma density	> 10e11 cm-3 at 10 cm	10e12 cm-3 at 10 cm