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Options Sputter Kathodes

Options Sputter Kathodes
Sputtering Kathodes can be fitted with an (in situ) tilt option capable of achieving extremely high levels of deposition uniformity when depositing onto a rotating substrate holder with adjustable working distance. Typically +/- 2.5% thickness uniformity is easily achieved over 4` diameter substrates.
The special isolation chimney prevents cross-contamination of target materials and allows the deposition profile to be fine tune.

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20 Item(s)

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